Mask Design Engineer - 80-100%

ph3Coherent Corp. /h3 pWe are the global leader in photonics, designing and manufacturing advanced laser, optical, and material technologies used by customers worldwide across industrial, communications, electronics, and instrumentation markets. /p pWith a broad global footprint and deep engineering capability, we combine advanced manufacturing, applied innovation, and customer collaboration to deliver high-performance solutions that enable critical technologies and solve complex, real-world challenges. /p h3About Coherent In Switzerland /h3 pCoherent Corp. Zurich is a key research and production hub specializing in advanced photonics, engineered materials, and high-power semiconductor laser technologies. Our teams develop and manufacture opto-electronic components and laser diodes for industrial, optical data transmission, life science, and high-precision applications, combining strong in-house RD with state-of-the-art semiconductor manufacturing in an engineering-led culture. /p pbLocation /b: Zurich, Switzerland (Onsite) | bEmployment Type: /b Permanent, 80-100% /p h3Job Summary /h3 pAs an bAdvanced Mask Design Engineer /b, you will develop and maintain photomask layouts for VCSEL, Edge Emitter, and Photodiode products from initial concept through to production. Working within our Process Integration team, you will collaborate closely with RD, Process Engineering, Lithography, and Production teams to develop advanced mask designs, establish layout standards, and support the introduction of new photonic products. You will also use programming and scripting to improve the efficiency, accuracy, and scalability of the mask design process. /p h3Key Responsibilities /h3 ul liDevelop and maintain photomask layouts for VCSEL, Edge Emitter, and Photodiode products from concept through to production /li liEstablish mask layout strategies and design methodologies for advanced lithographic processes, high-density 2D arrays, sub-100 nm patterns, and 2.5D features such as tapers and lenses /li liDefine, maintain, and improve design rules, layout standards, and verification methods /li liPlan and perform lithographic simulations and process verifications in close collaboration with RD, Process Engineering, and Lithography teams /li liSupport new product introductions through mask design reviews, design approvals, layout corrections, and technical consultation /li liDevelop scripts and programming solutions to improve the efficiency and consistency of mask design activities /liliManage mask-related documentation, manufacturing execution system (MES) activities, mask ordering, and engineering change processes /li /ul h3Qualifications /h3 pMaster’s degree or PhD in Electrical Engineering, Physics, Photonics, Microsystems Engineering, or a related technical field /p pExperience in photomask design and layout development for semiconductor or photonic devices, gained through professional experience, a thesis, research, or academic projects /p h3Additional Skills Requirements /h3 ul liExperience with advanced lithography concepts such as grayscale lithography, optical proximity effects, optical proximity correction, or submicron patterning is advantageous /li liKnowledge of stepper systems or deep ultraviolet lithography technology is advantageous /li liProficiency in Python programming, Git, and engineering data management tools /li liExcellent communication skills, a proactive approach, and the ability to collaborate effectively across multidisciplinary teams /li liFluent written and spoken English. German language skills are advantageous /li /ul pWe are an Equal Opportunity Employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, national origin, disability, age, or any other protected status. /p /p #J-18808-Ljbffr